Thin Film Morphologies of Bulk-Gyroid Polystyrene-block-polydimethylsiloxane under Solvent Vapor Annealing
AISSOU, Karim
Laboratoire de Chimie des Polymères Organiques [LCPO]
Team 4 LCPO : Polymer Materials for Electronic, Energy, Information and Communication Technologies
< Reduce
Laboratoire de Chimie des Polymères Organiques [LCPO]
Team 4 LCPO : Polymer Materials for Electronic, Energy, Information and Communication Technologies
Language
en
Article de revue
This item was published in
Macromolecules. 2014, vol. 47, n° 17, p. 6000-6008
American Chemical Society
English Abstract
Thin film morphologies of a 75.5 kg/mol polystyrene-block-polydimethylsiloxane (PS-PDMS) diblock copolymer (SD75) subject to solvent vapor annealing are described. The PS-b-PDMS has a double-gyroid morphology in bulk, but ...Read more >
Thin film morphologies of a 75.5 kg/mol polystyrene-block-polydimethylsiloxane (PS-PDMS) diblock copolymer (SD75) subject to solvent vapor annealing are described. The PS-b-PDMS has a double-gyroid morphology in bulk, but as a thin film the morphology consists of spheres, cylinders, perforated lamellae or gyroids, depending on the film thickness, its commensurability with the microdomain period, and the ratio of toluene:heptane vapors used for the solvent annealing process. The morphologies are described by self-consistent field theory simulations. Thin film structures with excellent long-range order were produced, which are promising for nano patterning applications.Read less <
English Keywords
TRANSITIONS
POLY(DIMETHYLSILOXANE)
DIMETHYLSILOXANE
DIBLOCK COPOLYMER
MOLECULAR-WEIGHT
PHASE
ORIENTATION
ARRAYS
LITHOGRAPHY
PATTERNS
Origin
Hal imported