Thin Film Morphologies of Bulk-Gyroid Polystyrene-block-polydimethylsiloxane under Solvent Vapor Annealing
| dc.rights.license | open | |
| hal.structure.identifier | MIT, Dept Mat Sci & Engn, Cambridge | |
| dc.contributor.author | BAI, Wubin | |
| hal.structure.identifier | MIT, Dept Mat Sci & Engn, Cambridge | |
| dc.contributor.author | HANNON, Adam F. | |
| hal.structure.identifier | MIT, Dept Mat Sci & Engn, Cambridge | |
| dc.contributor.author | GOTRIK, Kevin W. | |
| hal.structure.identifier | MIT, Dept Mat Sci & Engn, Cambridge | |
| dc.contributor.author | CHOI, Hong Kyoon | |
| hal.structure.identifier | Laboratoire de Chimie des Polymères Organiques [LCPO] | |
| hal.structure.identifier | Team 4 LCPO : Polymer Materials for Electronic, Energy, Information and Communication Technologies | |
| dc.contributor.author | AISSOU, Karim | |
| dc.contributor.author | LIONTOS, George | |
| hal.structure.identifier | MIT, Dept Mat Sci & Engn, Cambridge | |
| dc.contributor.author | ALEXANDER-KATZ, Alfredo | |
| dc.contributor.author | AVGEROPOULOS, Apostolos | |
| hal.structure.identifier | MIT, Dept Mat Sci & Engn, Cambridge | |
| dc.contributor.author | ROSS, Caroline A. | |
| dc.date.accessioned | 2020 | |
| dc.date.available | 2020 | |
| dc.date.issued | 2014 | |
| dc.identifier.issn | 0024-9297 | |
| dc.identifier.uri | https://oskar-bordeaux.fr/handle/20.500.12278/20211 | |
| dc.description.abstractEn | Thin film morphologies of a 75.5 kg/mol polystyrene-block-polydimethylsiloxane (PS-PDMS) diblock copolymer (SD75) subject to solvent vapor annealing are described. The PS-b-PDMS has a double-gyroid morphology in bulk, but as a thin film the morphology consists of spheres, cylinders, perforated lamellae or gyroids, depending on the film thickness, its commensurability with the microdomain period, and the ratio of toluene:heptane vapors used for the solvent annealing process. The morphologies are described by self-consistent field theory simulations. Thin film structures with excellent long-range order were produced, which are promising for nano patterning applications. | |
| dc.language.iso | en | |
| dc.publisher | American Chemical Society | |
| dc.subject.en | TRANSITIONS | |
| dc.subject.en | POLY(DIMETHYLSILOXANE) | |
| dc.subject.en | DIMETHYLSILOXANE | |
| dc.subject.en | DIBLOCK COPOLYMER | |
| dc.subject.en | MOLECULAR-WEIGHT | |
| dc.subject.en | PHASE | |
| dc.subject.en | ORIENTATION | |
| dc.subject.en | ARRAYS | |
| dc.subject.en | LITHOGRAPHY | |
| dc.subject.en | PATTERNS | |
| dc.title.en | Thin Film Morphologies of Bulk-Gyroid Polystyrene-block-polydimethylsiloxane under Solvent Vapor Annealing | |
| dc.type | Article de revue | |
| dc.identifier.doi | 10.1021/ma501293n | |
| dc.subject.hal | Chimie/Polymères | |
| bordeaux.journal | Macromolecules | |
| bordeaux.page | 6000-6008 | |
| bordeaux.volume | 47 | |
| bordeaux.hal.laboratories | Laboratoire de Chimie des Polymères Organiques (LCPO) - UMR 5629 | * |
| bordeaux.issue | 17 | |
| bordeaux.institution | Bordeaux INP | |
| bordeaux.institution | Université de Bordeaux | |
| bordeaux.peerReviewed | oui | |
| hal.identifier | hal-01369910 | |
| hal.version | 1 | |
| hal.origin.link | https://hal.archives-ouvertes.fr//hal-01369910v1 | |
| bordeaux.COinS | ctx_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.jtitle=Macromolecules&rft.date=2014&rft.volume=47&rft.issue=17&rft.spage=6000-6008&rft.epage=6000-6008&rft.eissn=0024-9297&rft.issn=0024-9297&rft.au=BAI,%20Wubin&HANNON,%20Adam%20F.&GOTRIK,%20Kevin%20W.&CHOI,%20Hong%20Kyoon&AISSOU,%20Karim&rft.genre=article |
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