BAI, Wubin; HANNON, Adam F.; GOTRIK, Kevin W.; CHOI, Hong Kyoon; AISSOU, Karim; LIONTOS, George; ALEXANDER-KATZ, Alfredo; AVGEROPOULOS, Apostolos; ROSS, Caroline A.

doi:10.1021/ma501293n

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BAI, Wubin
MIT, Dept Mat Sci & Engn, Cambridge

HANNON, Adam F.
MIT, Dept Mat Sci & Engn, Cambridge

GOTRIK, Kevin W.
MIT, Dept Mat Sci & Engn, Cambridge

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Macromolecules. 2014, vol. 47, n° 17, p. 6000-6008

American Chemical Society

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Thin film morphologies of a 75.5 kg/mol polystyrene-block-polydimethylsiloxane (PS-PDMS) diblock copolymer (SD75) subject to solvent vapor annealing are described. The PS-b-PDMS has a double-gyroid morphology in bulk, but as a thin film the morphology consists of spheres, cylinders, perforated lamellae or gyroids, depending on the film thickness, its commensurability with the microdomain period, and the ratio of toluene:heptane vapors used for the solvent annealing process. The morphologies are described by self-consistent field theory simulations. Thin film structures with excellent long-range order were produced, which are promising for nano patterning applications.< Leer menos

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TRANSITIONS

POLY(DIMETHYLSILOXANE)

DIMETHYLSILOXANE

DIBLOCK COPOLYMER

MOLECULAR-WEIGHT

PHASE

ORIENTATION

ARRAYS

LITHOGRAPHY

PATTERNS

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Thin Film Morphologies of Bulk-Gyroid Polystyrene-block-polydimethylsiloxane under Solvent Vapor Annealing

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