INTERACTION BETWEEN GAS DIFFUSION AND MULTISTABLE HETEROGENEOUS CHEMICAL KINETICS IN C/C COMPOSITE PROCESSING
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en
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This item was published in
Fundamentals of Gas-Phase and Surface Chemistry of Vapor-Phase Deposition II, Fundamentals of Gas-Phase and Surface Chemistry of Vapor-Phase Deposition II, Fundamentals of Gas-Phase and Surface Chemistry of Vapor-Phase Deposition II/ Process Control, Diagnostics and Modeling in Semiconductor Manufacturing IV, 2001-03-26, Washington. 2001, vol. 2001-13, p. 237--244
The Electrochemical Society, Pennington, NJ, USA
English Abstract
The sharpness of the smooth laminar/rough laminar (SL/RL) CVD/CVI pyrocarbon nanotexture transition is addressed in terms of a possible hysteretical chemical deposition mechanism, based on a bimolecular heterogeneous ...Read more >
The sharpness of the smooth laminar/rough laminar (SL/RL) CVD/CVI pyrocarbon nanotexture transition is addressed in terms of a possible hysteretical chemical deposition mechanism, based on a bimolecular heterogeneous deposition reaction step. Interaction of the hysteretical heterogeneous chemistry with the diffusive transport of the source species enhances the parameter domain of hysteresis, and even better at high Thiele modulus values. A ``toy-model'' is also studied to explain such a behavior.Read less <
Origin
Hal imported