INTERACTION BETWEEN GAS DIFFUSION AND MULTISTABLE HETEROGENEOUS CHEMICAL KINETICS IN C/C COMPOSITE PROCESSING
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en
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Ce document a été publié dans
Fundamentals of Gas-Phase and Surface Chemistry of Vapor-Phase Deposition II, Fundamentals of Gas-Phase and Surface Chemistry of Vapor-Phase Deposition II, Fundamentals of Gas-Phase and Surface Chemistry of Vapor-Phase Deposition II/ Process Control, Diagnostics and Modeling in Semiconductor Manufacturing IV, 2001-03-26, Washington. 2001, vol. 2001-13, p. 237--244
The Electrochemical Society, Pennington, NJ, USA
Résumé en anglais
The sharpness of the smooth laminar/rough laminar (SL/RL) CVD/CVI pyrocarbon nanotexture transition is addressed in terms of a possible hysteretical chemical deposition mechanism, based on a bimolecular heterogeneous ...Lire la suite >