INTERACTION BETWEEN GAS DIFFUSION AND MULTISTABLE HETEROGENEOUS CHEMICAL KINETICS IN C/C COMPOSITE PROCESSING
| hal.structure.identifier | Laboratoire des Composites Thermostructuraux [LCTS] | |
| dc.contributor.author | VIGNOLES, Gerard L. | |
| hal.structure.identifier | Institut de Mathématiques de Bordeaux [IMB] | |
| dc.contributor.author | BACONNEAU, Olivier | |
| hal.structure.identifier | Institut de Mathématiques de Bordeaux [IMB] | |
| dc.contributor.author | BRAUNER, Claude-Michel | |
| dc.contributor.editor | M. T. Swihart | |
| dc.contributor.editor | M. D. Allendorf | |
| dc.contributor.editor | and M. Meyyappan | |
| dc.date.accessioned | 2024-04-04T02:35:35Z | |
| dc.date.available | 2024-04-04T02:35:35Z | |
| dc.date.issued | 2001 | |
| dc.date.conference | 2001-03-26 | |
| dc.identifier.uri | https://oskar-bordeaux.fr/handle/20.500.12278/190652 | |
| dc.description.abstractEn | The sharpness of the smooth laminar/rough laminar (SL/RL) CVD/CVI pyrocarbon nanotexture transition is addressed in terms of a possible hysteretical chemical deposition mechanism, based on a bimolecular heterogeneous deposition reaction step. Interaction of the hysteretical heterogeneous chemistry with the diffusive transport of the source species enhances the parameter domain of hysteresis, and even better at high Thiele modulus values. A ``toy-model'' is also studied to explain such a behavior. | |
| dc.language.iso | en | |
| dc.publisher | The Electrochemical Society, Pennington, NJ, USA | |
| dc.source.title | Fundamentals of Gas-Phase and Surface Chemistry of Vapor-Phase Deposition II | |
| dc.title.en | INTERACTION BETWEEN GAS DIFFUSION AND MULTISTABLE HETEROGENEOUS CHEMICAL KINETICS IN C/C COMPOSITE PROCESSING | |
| dc.type | Communication dans un congrès | |
| dc.subject.hal | Chimie/Matériaux | |
| dc.subject.hal | Sciences de l'ingénieur [physics]/Génie des procédés | |
| bordeaux.page | 237--244 | |
| bordeaux.volume | 2001-13 | |
| bordeaux.hal.laboratories | Institut de Mathématiques de Bordeaux (IMB) - UMR 5251 | * |
| bordeaux.institution | Université de Bordeaux | |
| bordeaux.institution | Bordeaux INP | |
| bordeaux.institution | CNRS | |
| bordeaux.conference.title | Fundamentals of Gas-Phase and Surface Chemistry of Vapor-Phase Deposition II/ Process Control, Diagnostics and Modeling in Semiconductor Manufacturing IV | |
| bordeaux.country | US | |
| bordeaux.title.proceeding | Fundamentals of Gas-Phase and Surface Chemistry of Vapor-Phase Deposition II | |
| bordeaux.conference.city | Washington | |
| bordeaux.peerReviewed | oui | |
| hal.identifier | hal-00400022 | |
| hal.version | 1 | |
| hal.invited | non | |
| hal.proceedings | oui | |
| hal.conference.end | 2001-03-30 | |
| hal.popular | non | |
| hal.audience | Internationale | |
| hal.origin.link | https://hal.archives-ouvertes.fr//hal-00400022v1 | |
| bordeaux.COinS | ctx_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.btitle=Fundamentals%20of%20Gas-Phase%20and%20Surface%20Chemistry%20of%20Vapor-Phase%20Deposition%20II&rft.date=2001&rft.volume=2001-13&rft.spage=237--244&rft.epage=237--244&rft.au=VIGNOLES,%20Gerard%20L.&BACONNEAU,%20Olivier&BRAUNER,%20Claude-Michel&rft.genre=unknown |
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