Influence of the window thermal diffusivity on the silicon wafer temperature in a rapid thermal system
Langue
en
Article de revue
Ce document a été publié dans
Heat Transfer Engineering. 2015, vol. 36, n° 13, p. 1111-1121
Taylor & Francis
Résumé en anglais
The heating of a silicon wafer in a rapid thermal process is studied by numerical simulation. In the model, the equations of conservation of mass and energy are solved with the finite volume method and the determination ...Lire la suite >
Mots clés en anglais
Thermal Diffusivity
silicon wafer temperature
Rapid thermal system