Study of mechanisms involved in photoresist microlens formation
Idioma
en
Article de revue
Este ítem está publicado en
Microelectronic Engineering. 2006, vol. 83, n° 4-9, p. 1087-1090
Elsevier
Resumen en inglés
The mechanisms involved in photoresist microlens formation are investigated in order to understand the lack of sphericity of certain experimental microlenses. A characterization of the resist rheological properties has ...Leer más >
Palabras clave en inglés
crosslinking
rheological properties
microlens
reflow method