Study of mechanisms involved in photoresist microlens formation
HADZIIOANNOU, Georges
Team 4 LCPO : Polymer Materials for Electronic, Energy, Information and Communication Technologies
< Reduce
Team 4 LCPO : Polymer Materials for Electronic, Energy, Information and Communication Technologies
Language
en
Article de revue
This item was published in
Microelectronic Engineering. 2006, vol. 83, n° 4-9, p. 1087-1090
Elsevier
English Abstract
The mechanisms involved in photoresist microlens formation are investigated in order to understand the lack of sphericity of certain experimental microlenses. A characterization of the resist rheological properties has ...Read more >
The mechanisms involved in photoresist microlens formation are investigated in order to understand the lack of sphericity of certain experimental microlenses. A characterization of the resist rheological properties has enabled to demonstrate that there is a competition between surface tensions and resist crosslinking reaction during the final process bake. Depending on the process conditions, the crosslinking reaction kinetics dominate and prevent the correct formation of the microlens.Read less <
English Keywords
crosslinking
rheological properties
microlens
reflow method
Origin
Hal imported