Study of mechanisms involved in photoresist microlens formation
HADZIIOANNOU, Georges
Team 4 LCPO : Polymer Materials for Electronic, Energy, Information and Communication Technologies
< Réduire
Team 4 LCPO : Polymer Materials for Electronic, Energy, Information and Communication Technologies
Langue
en
Article de revue
Ce document a été publié dans
Microelectronic Engineering. 2006, vol. 83, n° 4-9, p. 1087-1090
Elsevier
Résumé en anglais
The mechanisms involved in photoresist microlens formation are investigated in order to understand the lack of sphericity of certain experimental microlenses. A characterization of the resist rheological properties has ...Lire la suite >
The mechanisms involved in photoresist microlens formation are investigated in order to understand the lack of sphericity of certain experimental microlenses. A characterization of the resist rheological properties has enabled to demonstrate that there is a competition between surface tensions and resist crosslinking reaction during the final process bake. Depending on the process conditions, the crosslinking reaction kinetics dominate and prevent the correct formation of the microlens.< Réduire
Mots clés en anglais
crosslinking
rheological properties
microlens
reflow method
Origine
Importé de halUnités de recherche