ZnO homoepitaxy on the O polar face of hydrothermal and melt-growth substrates by pulsed laser deposition
Langue
en
Article de revue
Ce document a été publié dans
Applied physics. A, Materials science & processing. 2007, vol. 88, n° 1, p. 49-56
Springer Verlag
Résumé en anglais
2 cm diameter hydrothermal ZnO crystals were grown and then made into substrates using both mechanical and chemical-mechanical polishing (CMP). CMP polishing showed superior results with an (0002) Ω scan full width half ...Lire la suite >
2 cm diameter hydrothermal ZnO crystals were grown and then made into substrates using both mechanical and chemical-mechanical polishing (CMP). CMP polishing showed superior results with an (0002) Ω scan full width half maximum (FWHM) of 67 arcsec and an root mean square (RMS) roughness of 2 Å. In comparison, commercial melt-grown substrates exhibited broader X-ray diffraction (XRD) linewidths with evidence of sub-surface crystal damage due to polishing, including a downward shift of c-lattice parameter...< Réduire
Mots clés en anglais
Chemical Mechanical Polishing
Full Width Half Maximum
Hydrothermal crystal growth
Glow Discharge Mass Spectroscopy
Root Mean Square Roughness
Polar Face
Origine
Importé de halUnités de recherche