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hal.structure.identifierNanovation SARL
hal.structure.identifierLaboratoire de Nanotechnologie et d'Instrumentation Optique [LNIO]
dc.contributor.authorROGERS, David
hal.structure.identifierNanovation SARL
dc.contributor.authorHOSSEINI TEHERANI, F.
hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorLARGETEAU, Alain
hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorDEMAZEAU, Gérard
hal.structure.identifierNOVASiC
dc.contributor.authorMOISSON, C.
hal.structure.identifierNOVASiC
dc.contributor.authorTUROVER, D.
hal.structure.identifierCermet Inc.
dc.contributor.authorNAUSE, J.
hal.structure.identifierThales Research
dc.contributor.authorGARRY, G.
hal.structure.identifierDepartment of Semiconductor Physics
dc.contributor.authorKLING, R.
hal.structure.identifierDepartment of Semiconductor Physics
dc.contributor.authorGRUBER, T.
hal.structure.identifierInstitute of Semiconductor Technology
dc.contributor.authorWAAG, A.
hal.structure.identifierLaboratoire de physique des solides et de cristallogénèse [LPSC]
dc.contributor.authorJOMARD, F.
hal.structure.identifierLaboratoire de physique des solides et de cristallogénèse [LPSC]
dc.contributor.authorGALTIER, P.
hal.structure.identifierLaboratoire de physique des solides et de cristallogénèse [LPSC]
dc.contributor.authorLUSSON, A.
hal.structure.identifierPhysics Department
dc.contributor.authorMONTEIRO, T.
hal.structure.identifierPhysics Department
dc.contributor.authorSOARES, M. J.
hal.structure.identifierPhysics Department
dc.contributor.authorNEVES, A.
hal.structure.identifierPhysics Department
dc.contributor.authorCARMO, M. C.
hal.structure.identifierPhysics Department
dc.contributor.authorPERES, M.
hal.structure.identifierLaboratoire de Nanotechnologie et d'Instrumentation Optique [LNIO]
dc.contributor.authorLERONDEL, Gilles
hal.structure.identifierLaboratoire de Nanotechnologie et d'Instrumentation Optique [LNIO]
dc.contributor.authorHUBERT, Christophe
dc.date.issued2007
dc.identifier.issn0947-8396
dc.description.abstractEn2 cm diameter hydrothermal ZnO crystals were grown and then made into substrates using both mechanical and chemical-mechanical polishing (CMP). CMP polishing showed superior results with an (0002) Ω scan full width half maximum (FWHM) of 67 arcsec and an root mean square (RMS) roughness of 2 Å. In comparison, commercial melt-grown substrates exhibited broader X-ray diffraction (XRD) linewidths with evidence of sub-surface crystal damage due to polishing, including a downward shift of c-lattice parameter...
dc.language.isoen
dc.publisherSpringer Verlag
dc.subject.enChemical Mechanical Polishing
dc.subject.enFull Width Half Maximum
dc.subject.enHydrothermal crystal growth
dc.subject.enGlow Discharge Mass Spectroscopy
dc.subject.enRoot Mean Square Roughness
dc.subject.enPolar Face
dc.title.enZnO homoepitaxy on the O polar face of hydrothermal and melt-growth substrates by pulsed laser deposition
dc.typeArticle de revue
dc.identifier.doi10.1007/s00339-007-3975-z
dc.subject.halChimie/Matériaux
bordeaux.journalApplied physics. A, Materials science & processing
bordeaux.page49-56
bordeaux.volume88
bordeaux.issue1
bordeaux.peerReviewedoui
hal.identifierhal-00155069
hal.version1
hal.popularnon
hal.audienceInternationale
hal.origin.linkhttps://hal.archives-ouvertes.fr//hal-00155069v1
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