ZnO homoepitaxy on the O polar face of hydrothermal and melt-growth substrates by pulsed laser deposition
Language
en
Article de revue
This item was published in
Applied physics. A, Materials science & processing. 2007, vol. 88, n° 1, p. 49-56
Springer Verlag
English Abstract
2 cm diameter hydrothermal ZnO crystals were grown and then made into substrates using both mechanical and chemical-mechanical polishing (CMP). CMP polishing showed superior results with an (0002) Ω scan full width half ...Read more >
2 cm diameter hydrothermal ZnO crystals were grown and then made into substrates using both mechanical and chemical-mechanical polishing (CMP). CMP polishing showed superior results with an (0002) Ω scan full width half maximum (FWHM) of 67 arcsec and an root mean square (RMS) roughness of 2 Å. In comparison, commercial melt-grown substrates exhibited broader X-ray diffraction (XRD) linewidths with evidence of sub-surface crystal damage due to polishing, including a downward shift of c-lattice parameter...Read less <
English Keywords
Chemical Mechanical Polishing
Full Width Half Maximum
Hydrothermal crystal growth
Glow Discharge Mass Spectroscopy
Root Mean Square Roughness
Polar Face
Origin
Hal imported