ZnO homoepitaxy on the O polar face of hydrothermal and melt-growth substrates by pulsed laser deposition
Idioma
en
Article de revue
Este ítem está publicado en
Applied physics. A, Materials science & processing. 2007, vol. 88, n° 1, p. 49-56
Springer Verlag
Resumen en inglés
2 cm diameter hydrothermal ZnO crystals were grown and then made into substrates using both mechanical and chemical-mechanical polishing (CMP). CMP polishing showed superior results with an (0002) Ω scan full width half ...Leer más >
2 cm diameter hydrothermal ZnO crystals were grown and then made into substrates using both mechanical and chemical-mechanical polishing (CMP). CMP polishing showed superior results with an (0002) Ω scan full width half maximum (FWHM) of 67 arcsec and an root mean square (RMS) roughness of 2 Å. In comparison, commercial melt-grown substrates exhibited broader X-ray diffraction (XRD) linewidths with evidence of sub-surface crystal damage due to polishing, including a downward shift of c-lattice parameter...< Leer menos
Palabras clave en inglés
Chemical Mechanical Polishing
Full Width Half Maximum
Hydrothermal crystal growth
Glow Discharge Mass Spectroscopy
Root Mean Square Roughness
Polar Face
Orígen
Importado de HalCentros de investigación