Structural and electrochemical studies of annealed LiNiVO4 thin films
REDDY, M. V.
Institut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
Department of Physics (Singapore)
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Institut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
Department of Physics (Singapore)
REDDY, M. V.
Institut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
Department of Physics (Singapore)
< Leer menos
Institut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
Department of Physics (Singapore)
Idioma
en
Article de revue
Este ítem está publicado en
Surface and Interface Analysis. 2007, vol. 39, n° 8, p. 653-659
Wiley-Blackwell
Resumen en inglés
We prepared stoichiometric lithium nickel vanadate amorphous thin films by using r.f. magnetron sputtering under controlled oxygen partial pressure. The amorphous films were heated at various temperatures, 300-600 °C, for ...Leer más >
We prepared stoichiometric lithium nickel vanadate amorphous thin films by using r.f. magnetron sputtering under controlled oxygen partial pressure. The amorphous films were heated at various temperatures, 300-600 °C, for 8 h. The as-deposited and annealed thin films were characterized by Rutherford backscattering spectroscopy, nuclear reaction analysis, Auger electron spectroscopy, X-ray diffraction, scanning electron microscopy and atomic force microscopy. The electrochemical behavior of the various films was studied by the galvanostatic method...< Leer menos
Palabras clave en inglés
Surface analysis
Annealed lithium nickel vanadate films
r.f. sputtering
Lithium microbatteries
Negative electrode
Electrochemical properties
Orígen
Importado de HalCentros de investigación