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hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
hal.structure.identifierDepartment of Physics (Singapore)
dc.contributor.authorREDDY, M. V.
hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorPECQUENARD, Brigitte
hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorVINATIER, Philippe
hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorLEVASSEUR, Alain
dc.date.issued2007
dc.identifier.issn0142-2421
dc.description.abstractEnWe prepared stoichiometric lithium nickel vanadate amorphous thin films by using r.f. magnetron sputtering under controlled oxygen partial pressure. The amorphous films were heated at various temperatures, 300-600 °C, for 8 h. The as-deposited and annealed thin films were characterized by Rutherford backscattering spectroscopy, nuclear reaction analysis, Auger electron spectroscopy, X-ray diffraction, scanning electron microscopy and atomic force microscopy. The electrochemical behavior of the various films was studied by the galvanostatic method...
dc.language.isoen
dc.publisherWiley-Blackwell
dc.subject.enSurface analysis
dc.subject.enAnnealed lithium nickel vanadate films
dc.subject.enr.f. sputtering
dc.subject.enLithium microbatteries
dc.subject.enNegative electrode
dc.subject.enElectrochemical properties
dc.title.enStructural and electrochemical studies of annealed LiNiVO4 thin films
dc.typeArticle de revue
dc.identifier.doi10.1002/sia.2569
dc.subject.halChimie/Matériaux
bordeaux.journalSurface and Interface Analysis
bordeaux.page653-659
bordeaux.volume39
bordeaux.issue8
bordeaux.peerReviewedoui
hal.identifierhal-00168508
hal.version1
hal.popularnon
hal.audienceInternationale
hal.origin.linkhttps://hal.archives-ouvertes.fr//hal-00168508v1
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