Structural and electrochemical studies of annealed LiNiVO4 thin films
REDDY, M. V.
Institut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
Department of Physics (Singapore)
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Institut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
Department of Physics (Singapore)
REDDY, M. V.
Institut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
Department of Physics (Singapore)
< Reduce
Institut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
Department of Physics (Singapore)
Language
en
Article de revue
This item was published in
Surface and Interface Analysis. 2007, vol. 39, n° 8, p. 653-659
Wiley-Blackwell
English Abstract
We prepared stoichiometric lithium nickel vanadate amorphous thin films by using r.f. magnetron sputtering under controlled oxygen partial pressure. The amorphous films were heated at various temperatures, 300-600 °C, for ...Read more >
We prepared stoichiometric lithium nickel vanadate amorphous thin films by using r.f. magnetron sputtering under controlled oxygen partial pressure. The amorphous films were heated at various temperatures, 300-600 °C, for 8 h. The as-deposited and annealed thin films were characterized by Rutherford backscattering spectroscopy, nuclear reaction analysis, Auger electron spectroscopy, X-ray diffraction, scanning electron microscopy and atomic force microscopy. The electrochemical behavior of the various films was studied by the galvanostatic method...Read less <
English Keywords
Surface analysis
Annealed lithium nickel vanadate films
r.f. sputtering
Lithium microbatteries
Negative electrode
Electrochemical properties
Origin
Hal imported