Structural and electrochemical studies of annealed LiNiVO4 thin films
REDDY, M. V.
Institut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
Department of Physics (Singapore)
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Institut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
Department of Physics (Singapore)
REDDY, M. V.
Institut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
Department of Physics (Singapore)
< Réduire
Institut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
Department of Physics (Singapore)
Langue
en
Article de revue
Ce document a été publié dans
Surface and Interface Analysis. 2007, vol. 39, n° 8, p. 653-659
Wiley-Blackwell
Résumé en anglais
We prepared stoichiometric lithium nickel vanadate amorphous thin films by using r.f. magnetron sputtering under controlled oxygen partial pressure. The amorphous films were heated at various temperatures, 300-600 °C, for ...Lire la suite >
We prepared stoichiometric lithium nickel vanadate amorphous thin films by using r.f. magnetron sputtering under controlled oxygen partial pressure. The amorphous films were heated at various temperatures, 300-600 °C, for 8 h. The as-deposited and annealed thin films were characterized by Rutherford backscattering spectroscopy, nuclear reaction analysis, Auger electron spectroscopy, X-ray diffraction, scanning electron microscopy and atomic force microscopy. The electrochemical behavior of the various films was studied by the galvanostatic method...< Réduire
Mots clés en anglais
Surface analysis
Annealed lithium nickel vanadate films
r.f. sputtering
Lithium microbatteries
Negative electrode
Electrochemical properties
Origine
Importé de halUnités de recherche