Surface modification of phyllosilicate minerals by fluorination methods
Language
en
Article de revue
This item was published in
Journal of Vacuum Science & Technology A. 2010, vol. 28, n° 2, p. 373-381
American Vacuum Society
English Abstract
The<sup> </sup>effect of fluorination on various types of phyllosilicate minerals has<sup> </sup>been investigated. Two different fluorination techniques have been used: direct<sup> </sup>F<sub>2</sub> gas and cold radio ...Read more >
The<sup> </sup>effect of fluorination on various types of phyllosilicate minerals has<sup> </sup>been investigated. Two different fluorination techniques have been used: direct<sup> </sup>F<sub>2</sub> gas and cold radio frequency plasma involving <i>c</i>-C<sub>4</sub>F<sub>8</sub> or<sup> </sup>O<sub>2</sub>/CF<sub>4</sub> mixtures. The modifications of the surface composition and properties<sup> </sup>have been followed mostly by x-ray photoelectron spectroscopy (XPS). Depending<sup> </sup>of the fluorination reagents, a reactive etching process involving <i>M</i>-F<sup> </sup>bonding occurs (direct F<sub>2</sub> gas; O<sub>2</sub>–CF<sub>4</sub> rf plasma) or a<sup> </sup>carbon fluoride deposition takes place (<i>c</i>-C<sub>4</sub>F<sub>8</sub> rf plasma). In the<sup> </sup>case of F<sub>2</sub>-gas treated minerals, Si 2<i>p</i> XPS signal accounts<sup> </sup>for the presence of fluorinated Si environments.Read less <
Origin
Hal imported