Surface modification of phyllosilicate minerals by fluorination methods
| hal.structure.identifier | Institut de Chimie de la Matière Condensée de Bordeaux [ICMCB] | |
| dc.contributor.author | TRESSAUD, Alain | |
| hal.structure.identifier | Institut de Chimie de la Matière Condensée de Bordeaux [ICMCB] | |
| dc.contributor.author | LABRUGÈRE, Christine | |
| hal.structure.identifier | Institut de Chimie de la Matière Condensée de Bordeaux [ICMCB] | |
| dc.contributor.author | DURAND, Etienne | |
| hal.structure.identifier | Institut de Chimie de la Matière Condensée de Bordeaux [ICMCB] | |
| dc.contributor.author | SERIER, Hélène | |
| hal.structure.identifier | Institute of Geology and Nature Management | |
| dc.contributor.author | DEMYANOVA, Larisa P. | |
| dc.date.issued | 2010 | |
| dc.identifier.issn | 0734-2101 | |
| dc.description.abstractEn | The<sup> </sup>effect of fluorination on various types of phyllosilicate minerals has<sup> </sup>been investigated. Two different fluorination techniques have been used: direct<sup> </sup>F<sub>2</sub> gas and cold radio frequency plasma involving <i>c</i>-C<sub>4</sub>F<sub>8</sub> or<sup> </sup>O<sub>2</sub>/CF<sub>4</sub> mixtures. The modifications of the surface composition and properties<sup> </sup>have been followed mostly by x-ray photoelectron spectroscopy (XPS). Depending<sup> </sup>of the fluorination reagents, a reactive etching process involving <i>M</i>-F<sup> </sup>bonding occurs (direct F<sub>2</sub> gas; O<sub>2</sub>–CF<sub>4</sub> rf plasma) or a<sup> </sup>carbon fluoride deposition takes place (<i>c</i>-C<sub>4</sub>F<sub>8</sub> rf plasma). In the<sup> </sup>case of F<sub>2</sub>-gas treated minerals, Si 2<i>p</i> XPS signal accounts<sup> </sup>for the presence of fluorinated Si environments. | |
| dc.language.iso | en | |
| dc.publisher | American Vacuum Society | |
| dc.title.en | Surface modification of phyllosilicate minerals by fluorination methods | |
| dc.type | Article de revue | |
| dc.identifier.doi | 10.1116/1.3328826 | |
| dc.subject.hal | Chimie/Matériaux | |
| bordeaux.journal | Journal of Vacuum Science & Technology A | |
| bordeaux.page | 373-381 | |
| bordeaux.volume | 28 | |
| bordeaux.issue | 2 | |
| bordeaux.peerReviewed | oui | |
| hal.identifier | hal-00470646 | |
| hal.version | 1 | |
| hal.popular | non | |
| hal.audience | Internationale | |
| hal.origin.link | https://hal.archives-ouvertes.fr//hal-00470646v1 | |
| bordeaux.COinS | ctx_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.jtitle=Journal%20of%20Vacuum%20Science%20&%20Technology%20A&rft.date=2010&rft.volume=28&rft.issue=2&rft.spage=373-381&rft.epage=373-381&rft.eissn=0734-2101&rft.issn=0734-2101&rft.au=TRESSAUD,%20Alain&LABRUG%C3%88RE,%20Christine&DURAND,%20Etienne&SERIER,%20H%C3%A9l%C3%A8ne&DEMYANOVA,%20Larisa%20P.&rft.genre=article |
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