Temperature dependence of luminescence for different surface flaws in high purity silica glass
FOURNIER, Jessica
Centre d'études scientifiques et techniques d'Aquitaine (CESTA-CEA) [CESTA]
Institut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
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Centre d'études scientifiques et techniques d'Aquitaine (CESTA-CEA) [CESTA]
Institut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
FOURNIER, Jessica
Centre d'études scientifiques et techniques d'Aquitaine (CESTA-CEA) [CESTA]
Institut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
< Réduire
Centre d'études scientifiques et techniques d'Aquitaine (CESTA-CEA) [CESTA]
Institut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
Langue
en
Article de revue
Ce document a été publié dans
Optical Materials Express. 2013, vol. 3, n° 1, p. 1-10
OSA pub
Résumé en anglais
In situ temperature dependence of the Photoluminescence under 325nm irradiation is used to investigate defect populations existing in different surface flaws in high purity fused silica. Five photoluminescence bands peaking ...Lire la suite >
In situ temperature dependence of the Photoluminescence under 325nm irradiation is used to investigate defect populations existing in different surface flaws in high purity fused silica. Five photoluminescence bands peaking at 1.9, 2.1, 2.3, 2.63 and 3.11 eV have been detected in the spectral area ranging from 1.6 up to 3.6 eV. The Gaussian deconvolution of spectra allows dividing the five luminescence bands in two categories. The former corresponds to bands showing a significant intensity enhancement while temperature decreases; the latter corresponds to bands remaining insensitive to the temperature evolution. Such a behavior brings new information on defects involved in laser damage mechanism at 351 nm in nanosecond regime.< Réduire
Mots clés en anglais
Fluorescence microscopy
Laser damage
Glass
Optics
Origine
Importé de halUnités de recherche