Temperature dependence of luminescence for different surface flaws in high purity silica glass
FOURNIER, Jessica
Centre d'études scientifiques et techniques d'Aquitaine (CESTA-CEA) [CESTA]
Institut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
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Centre d'études scientifiques et techniques d'Aquitaine (CESTA-CEA) [CESTA]
Institut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
FOURNIER, Jessica
Centre d'études scientifiques et techniques d'Aquitaine (CESTA-CEA) [CESTA]
Institut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
< Leer menos
Centre d'études scientifiques et techniques d'Aquitaine (CESTA-CEA) [CESTA]
Institut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
Idioma
en
Article de revue
Este ítem está publicado en
Optical Materials Express. 2013, vol. 3, n° 1, p. 1-10
OSA pub
Resumen en inglés
In situ temperature dependence of the Photoluminescence under 325nm irradiation is used to investigate defect populations existing in different surface flaws in high purity fused silica. Five photoluminescence bands peaking ...Leer más >
In situ temperature dependence of the Photoluminescence under 325nm irradiation is used to investigate defect populations existing in different surface flaws in high purity fused silica. Five photoluminescence bands peaking at 1.9, 2.1, 2.3, 2.63 and 3.11 eV have been detected in the spectral area ranging from 1.6 up to 3.6 eV. The Gaussian deconvolution of spectra allows dividing the five luminescence bands in two categories. The former corresponds to bands showing a significant intensity enhancement while temperature decreases; the latter corresponds to bands remaining insensitive to the temperature evolution. Such a behavior brings new information on defects involved in laser damage mechanism at 351 nm in nanosecond regime.< Leer menos
Palabras clave en inglés
Fluorescence microscopy
Laser damage
Glass
Optics
Orígen
Importado de HalCentros de investigación