Temperature dependence of luminescence for different surface flaws in high purity silica glass
FOURNIER, Jessica
Centre d'études scientifiques et techniques d'Aquitaine (CESTA-CEA) [CESTA]
Institut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
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Centre d'études scientifiques et techniques d'Aquitaine (CESTA-CEA) [CESTA]
Institut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
FOURNIER, Jessica
Centre d'études scientifiques et techniques d'Aquitaine (CESTA-CEA) [CESTA]
Institut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
< Reduce
Centre d'études scientifiques et techniques d'Aquitaine (CESTA-CEA) [CESTA]
Institut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
Language
en
Article de revue
This item was published in
Optical Materials Express. 2013, vol. 3, n° 1, p. 1-10
OSA pub
English Abstract
In situ temperature dependence of the Photoluminescence under 325nm irradiation is used to investigate defect populations existing in different surface flaws in high purity fused silica. Five photoluminescence bands peaking ...Read more >
In situ temperature dependence of the Photoluminescence under 325nm irradiation is used to investigate defect populations existing in different surface flaws in high purity fused silica. Five photoluminescence bands peaking at 1.9, 2.1, 2.3, 2.63 and 3.11 eV have been detected in the spectral area ranging from 1.6 up to 3.6 eV. The Gaussian deconvolution of spectra allows dividing the five luminescence bands in two categories. The former corresponds to bands showing a significant intensity enhancement while temperature decreases; the latter corresponds to bands remaining insensitive to the temperature evolution. Such a behavior brings new information on defects involved in laser damage mechanism at 351 nm in nanosecond regime.Read less <
English Keywords
Fluorescence microscopy
Laser damage
Glass
Optics
Origin
Hal imported