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Hyperbranched Polymers for Photolithographic Applications - Towards Understanding the Relationship between Chemical Structure of Polymer Resin and Lithographic Performances

CHOCHOS, Christos L.
ISMAILOVA, Esma
BROCHON, Cyril
Team 4 LCPO : Polymer Materials for Electronic, Energy, Information and Communication Technologies
Laboratoire de Chimie des Polymères Organiques [LCPO]
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Langue
en
Article de revue
Ce document a été publié dans
Advanced Materials. 2009, vol. 21, n° 10-11, p. 1121-1125
Wiley-VCH Verlag
Résumé en anglais
A chemically amplified resist based on a hyperbranched polymer resin is demonstrated for the first time. The hyperbranched polymer is synthesized using the atom-transfer radical polymerization (ATRP) technique, and resists ...Lire la suite >
Mots clés en anglais
AMPLIFICATION
SCANNING PROBE LITHOGRAPHY
ATOMIC-FORCE MICROSCOPY
RADICAL POLYMERIZATION
RAFT POLYMERIZATION
NM LITHOGRAPHY
END-GROUPS
MICROLITHOGRAPHY
PHOTORESISTS
COPOLYMERS
URI
https://oskar-bordeaux.fr/handle/20.500.12278/20374
DOI
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