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Hyperbranched Polymers for Photolithographic Applications - Towards Understanding the Relationship between Chemical Structure of Polymer Resin and Lithographic Performances

dc.rights.licenseopen
dc.contributor.authorCHOCHOS, Christos L.
dc.contributor.authorISMAILOVA, Esma
hal.structure.identifierTeam 4 LCPO : Polymer Materials for Electronic, Energy, Information and Communication Technologies
hal.structure.identifierLaboratoire de Chimie des Polymères Organiques [LCPO]
dc.contributor.authorBROCHON, Cyril
dc.contributor.authorLECLERC, Nicolas
hal.structure.identifierCommissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information [CEA-LETI]
dc.contributor.authorTIRON, Raluca
hal.structure.identifierCommissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information [CEA-LETI]
dc.contributor.authorSOURD, Claire
hal.structure.identifierCommissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information [CEA-LETI]
dc.contributor.authorBANDELIER, Philippe
hal.structure.identifierLithography Laboratory
dc.contributor.authorFOUCHER, Johann
dc.contributor.authorRIDAOUI, Hassan
dc.contributor.authorDIRANI, Ali
hal.structure.identifierDépartement de Photochimie Générale [DPG]
dc.contributor.authorSOPPERA, Olivier
hal.structure.identifierRohm et Haas Electronic Materials
dc.contributor.authorPERRET, Damien
hal.structure.identifierRohm et Haas Electronic Materials
dc.contributor.authorBRAULT, Christophe
dc.contributor.authorSERRA, Christophe
hal.structure.identifierTeam 4 LCPO : Polymer Materials for Electronic, Energy, Information and Communication Technologies
hal.structure.identifierLaboratoire de Chimie des Polymères Organiques [LCPO]
dc.contributor.authorHADZIIOANNOU, Georges
dc.date.accessioned2020
dc.date.available2020
dc.date.issued2009
dc.identifier.issn0935-9648
dc.identifier.urihttps://oskar-bordeaux.fr/handle/20.500.12278/20374
dc.description.abstractEnA chemically amplified resist based on a hyperbranched polymer resin is demonstrated for the first time. The hyperbranched polymer is synthesized using the atom-transfer radical polymerization (ATRP) technique, and resists prepared from this hyperbranched polymer present good pattern profiles and line-edge roughness (3 sigma) values comparable to those of the reference (commercial) resist.
dc.language.isoen
dc.publisherWiley-VCH Verlag
dc.subject.enAMPLIFICATION
dc.subject.enSCANNING PROBE LITHOGRAPHY
dc.subject.enATOMIC-FORCE MICROSCOPY
dc.subject.enRADICAL POLYMERIZATION
dc.subject.enRAFT POLYMERIZATION
dc.subject.enNM LITHOGRAPHY
dc.subject.enEND-GROUPS
dc.subject.enMICROLITHOGRAPHY
dc.subject.enPHOTORESISTS
dc.subject.enCOPOLYMERS
dc.title.enHyperbranched Polymers for Photolithographic Applications - Towards Understanding the Relationship between Chemical Structure of Polymer Resin and Lithographic Performances
dc.typeArticle de revue
dc.identifier.doi10.1002/adma.200801715
dc.subject.halChimie/Polymères
bordeaux.journalAdvanced Materials
bordeaux.page1121-1125
bordeaux.volume21
bordeaux.hal.laboratoriesLaboratoire de Chimie des Polymères Organiques (LCPO) - UMR 5629*
bordeaux.issue10-11
bordeaux.institutionBordeaux INP
bordeaux.institutionUniversité de Bordeaux
bordeaux.peerReviewedoui
hal.identifierhal-00945178
hal.version1
hal.origin.linkhttps://hal.archives-ouvertes.fr//hal-00945178v1
bordeaux.COinSctx_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.jtitle=Advanced%20Materials&rft.date=2009&rft.volume=21&rft.issue=10-11&rft.spage=1121-1125&rft.epage=1121-1125&rft.eissn=0935-9648&rft.issn=0935-9648&rft.au=CHOCHOS,%20Christos%20L.&ISMAILOVA,%20Esma&BROCHON,%20Cyril&LECLERC,%20Nicolas&TIRON,%20Raluca&rft.genre=article


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