XPS analysis of the lithium intercalation in amorphous tungsten oxysulfide thin films
DUPIN, Jean-Charles
Institut des sciences analytiques et de physico-chimie pour l'environnement et les materiaux [IPREM]
Institut des sciences analytiques et de physico-chimie pour l'environnement et les materiaux [IPREM]
GONBEAU, Danielle
Institut des sciences analytiques et de physico-chimie pour l'environnement et les materiaux [IPREM]
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Institut des sciences analytiques et de physico-chimie pour l'environnement et les materiaux [IPREM]
Language
en
Article de revue
This item was published in
Journal of Power Sources. 1999, vol. 81-82, p. 306-311
Elsevier
English Abstract
Amorphous thin films of tungsten oxysulfide have been prepared by radio frequency (RF) magnetron sputtering. The composition of thin films is varied by changing the pressure of the reactive gas (O2) and discharge gas (Ar ...Read more >
Amorphous thin films of tungsten oxysulfide have been prepared by radio frequency (RF) magnetron sputtering. The composition of thin films is varied by changing the pressure of the reactive gas (O2) and discharge gas (Ar + O2) in the sputtering chamber. The X-ray photoelectron spectroscopy (XPS) studies of the thin films have shown three different types of environment for tungsten atoms: W6+ surrounded by oxygen O2-, W4+ surrounded by sulphur S2- and W5+ in a mixed oxygen-sulphur environment consisting of O2-, S2- and S22- pairs. The electrochemical characterisation of the film was performed in the Li/LiPF6-EC-DMC/WOySz cell. The XPS during intercalation evidences the role of W6+ and S22- in the redox process. © 1999 Elsevier Science S.A. All rights reserved.Read less <
English Keywords
Thin films
XPS analysis
Lithium batteries
RF magnetron sputtering
Transition element oxysulfide
Origin
Hal imported