CHEVIOT, Maureen; GOUNÉ, Mohamed; POULON-QUINTIN, Angeline

doi:10.1016/j.surfcoat.2015.08.075

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CHEVIOT, Maureen
Institut de Chimie de la Matière Condensée de Bordeaux [ICMCB]

GOUNÉ, Mohamed
Institut de Chimie de la Matière Condensée de Bordeaux [ICMCB]

POULON-QUINTIN, Angeline
Institut de Chimie de la Matière Condensée de Bordeaux [ICMCB]

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Surface and Coatings Technology. 2015, vol. 284, p. 192–197

Elsevier

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Tantalum nitride thin films were deposited onto WC-6%Co substrates using reactive RF magnetron sputtering. Their structure and microstructure were studied and analyzed according to processing parameters. It has been demonstrated that the weight ratio of hexagonal TaN (h-TaN) to face centered cubic TaN (fcc-TaN) strongly depends on adatoms mobility on the substrate surface. In particular, growth conditions promoting adatoms mobility, i.e. low N2 partial pressure, total gas pressure, target-to-substrate distance as well as high target power density, promote the formation of h-TaN structure. Both exclusively fcc-TaN and exclusively h-TaN films were synthesized. A possible mechanism for the stabilization of those structures is discussed.< Leer menos

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Tantalum nitride

Thin film

Reactive sputtering

Structure control

Quenching

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Monitoring tantalum nitride thin film structure by reactive RF magnetron sputtering: Influence of processing parameters

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