Structural and electrical properties of BaTi1−xZrxO3 sputtered thin films: effect of the sputtering conditions
Langue
en
Article de revue
Ce document a été publié dans
Thin Solid Films. 2004, vol. 467, n° 1-2, p. 54-58
Elsevier
Résumé en anglais
aTi1−xZrxO3 thin films have been prepared on Si and Pt/TiO2/SiO2/Si substrates by radio-frequency magnetron sputtering varying the deposition parameters, such as the chamber pressure, the substrate temperature and the gas ...Lire la suite >
Mots clés en anglais
Structural properties
Thin films
BaTi1−xZrxO3
Sputtering
Dielectric properties