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hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorREYMOND, Vincent
hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorPAYAN, Sandrine
hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorMICHAU, Dominique
hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorMANAUD, Jean-Pierre
hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorMAGLIONE, Mario
dc.date.issued2004
dc.identifier.issn0040-6090
dc.description.abstractEnaTi1−xZrxO3 thin films have been prepared on Si and Pt/TiO2/SiO2/Si substrates by radio-frequency magnetron sputtering varying the deposition parameters, such as the chamber pressure, the substrate temperature and the gas composition. The films have been probed by X-ray Diffraction (XRD), Wavelength Dispersive Spectrometry (WDS), Scanning Electron Microscopy (SEM) and Rutherford Backscattering Spectrometry (RBS)...
dc.language.isoen
dc.publisherElsevier
dc.subject.enStructural properties
dc.subject.enThin films
dc.subject.enBaTi1−xZrxO3
dc.subject.enSputtering
dc.subject.enDielectric properties
dc.title.enStructural and electrical properties of BaTi1−xZrxO3 sputtered thin films: effect of the sputtering conditions
dc.typeArticle de revue
dc.identifier.doi10.1016/j.tsf.2004.03.005
dc.subject.halChimie/Matériaux
bordeaux.journalThin Solid Films
bordeaux.page54-58
bordeaux.volume467
bordeaux.issue1-2
bordeaux.peerReviewedoui
hal.identifierhal-00159589
hal.version1
hal.popularnon
hal.audienceInternationale
hal.origin.linkhttps://hal.archives-ouvertes.fr//hal-00159589v1
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