Supercritical fluid chemical deposition as an alternative process to CVD for the surface modification of materials
Idioma
en
Article de revue
Este ítem está publicado en
Chemical Vapor Deposition. 2011, vol. 17, n° 10-12, p. 342-352
Wiley-VCH Verlag
Resumen en inglés
Taking the desirable attributes of CVD and aqueous plating techniques while minimizing the disadvantages of each, supercritical fluid chemical deposition (SFCD) demonstrates itself to be a promising process alternative to ...Leer más >
Taking the desirable attributes of CVD and aqueous plating techniques while minimizing the disadvantages of each, supercritical fluid chemical deposition (SFCD) demonstrates itself to be a promising process alternative to enable the fabrication of nanostructured devices. This paper gives information about the SFCD process for metal deposition as an alternative to CVD through various examples of inorganic deposition (films or nanostructures). In particular, the use of SFCD will be demonstrated for the surface modification of carbon nanotubes (CNTs) and their decoration with palladium nanoparticles.< Leer menos
Palabras clave en italiano
Chemical deposition
Nanomaterials
Supercritical fluids
Surface modification
Orígen
Importado de HalCentros de investigación