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hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorMAJIMEL, Mélanie
hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorMARRE, Samuel
hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorGARRIDO, Elsa
hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorAYMONIER, Cyril
dc.date.issued2011
dc.identifier.issn0948-1907
dc.description.abstractEnTaking the desirable attributes of CVD and aqueous plating techniques while minimizing the disadvantages of each, supercritical fluid chemical deposition (SFCD) demonstrates itself to be a promising process alternative to enable the fabrication of nanostructured devices. This paper gives information about the SFCD process for metal deposition as an alternative to CVD through various examples of inorganic deposition (films or nanostructures). In particular, the use of SFCD will be demonstrated for the surface modification of carbon nanotubes (CNTs) and their decoration with palladium nanoparticles.
dc.language.isoen
dc.publisherWiley-VCH Verlag
dc.title.enSupercritical fluid chemical deposition as an alternative process to CVD for the surface modification of materials
dc.typeArticle de revue
dc.identifier.doi10.1002/cvde.201106921
dc.subject.halChimie/Matériaux
bordeaux.journalChemical Vapor Deposition
bordeaux.page342-352
bordeaux.volume17
bordeaux.issue10-12
bordeaux.peerReviewedoui
hal.identifierhal-00653329
hal.version1
hal.popularnon
hal.audienceInternationale
dc.subject.itChemical deposition
dc.subject.itNanomaterials
dc.subject.itSupercritical fluids
dc.subject.itSurface modification
hal.origin.linkhttps://hal.archives-ouvertes.fr//hal-00653329v1
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