Influence of sputtering conditions on ionic conductivity of LiPON thin films
HAMON, Yohann
Institut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
CEA Le Ripault [CEA Le Ripault]
Voir plus >
Institut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
CEA Le Ripault [CEA Le Ripault]
HAMON, Yohann
Institut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
CEA Le Ripault [CEA Le Ripault]
< Réduire
Institut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
CEA Le Ripault [CEA Le Ripault]
Langue
en
Article de revue
Ce document a été publié dans
Solid State Ionics. 2006, vol. vol. 177, n° 3-4, p. p. 257-261
Elsevier
Résumé en anglais
LiPON films were deposited using radio-frequency magnetron sputtering in a pure N2 gas atmosphere. The influence of rf power, N2 pressure, target–substrate distance and target density on thin film composition and ionic ...Lire la suite >
LiPON films were deposited using radio-frequency magnetron sputtering in a pure N2 gas atmosphere. The influence of rf power, N2 pressure, target–substrate distance and target density on thin film composition and ionic conductivity has been studied. Impedance measurements performed between 25 and 80 °C have indicated that ionic conductivity increases with nitrogen incorporation into the glass structure. An increase in the deposition rate with the target density has also been observed.< Réduire
Mots clés en anglais
Solid electrolyte
Thin films
Ionic conductivity
Sputtering target density
Origine
Importé de halUnités de recherche