AISSOU, Karim; MUMTAZ, Muhammad; PORTALE, Giuseppe; BROCHON, Cyril; CLOUTET, Eric; FLEURY, Guillaume; HADZIIOANNOU, Georges

doi:10.1002/smll.201603777

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AISSOU, Karim
Team 4 LCPO : Polymer Materials for Electronic, Energy, Information and Communication Technologies
Laboratoire de Chimie des Polymères Organiques [LCPO]

MUMTAZ, Muhammad
Laboratoire de Chimie des Polymères Organiques [LCPO]
Team 4 LCPO : Polymer Materials for Electronic, Energy, Information and Communication Technologies

PORTALE, Giuseppe

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Small. 2017, vol. 13, n° 20, p. 1603777

Wiley-VCH Verlag

Résumé en anglais

The directed self-assembly of diblock copolymer chains (poly(1,1-dimethylsilacyclobutane)-block-polystyrene, PDMSB-b-PS) into a thin film double gyroid structure is described. A decrease of the kinetics of a typical double-wave pattern formation is reported within the 3D-nanostructure when the film thickness on mesas is lower than the gyroid unit cell. However, optimization of the solvent-vapor annealing process results in very large grains (over 10 μm²) with specific orientation (i.e., parallel to the air substrate) and direction (i.e., along the groove direction) of the characteristic (211) plane, demonstrated by templating sub-100-nm-thick PDMSB-b-PS films.< Réduire

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double gyroid

copolymer

directed self-assembly

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Templated Sub-100-nm-Thick Double-Gyroid Structure from Si-Containing Block Copolymer Thin Films

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