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Scaling-down lithographic dimensions with block-copolymer materials: 10-nm-sized features with poly(styrene)-block-poly(methylmethacrylate)
(Journal of Micro-Nanolitography MEMS and MOEMS. vol. 12, n° 3, pp. Nb 031102, 2013)Article de revue -
Chemically Amplified Photoresists for 193-nm Photolithography: Effect of Molecular Structure and Photonic Parameters on Photopatterning
(Journal of polymer science: Part A, General papers. vol. 48, n° 6, pp. 1271-1277, 2010)Article de revue -
Impact of molecular structure of polymer in 193 nm resist performance
(Microelectronic Engineering. vol. 86, n° 4-6, pp. 796-799, 2009)Article de revue -
Hyperbranched Polymers for Photolithographic Applications - Towards Understanding the Relationship between Chemical Structure of Polymer Resin and Lithographic Performances
(Advanced Materials. vol. 21, n° 10-11, pp. 1121-1125, 2009)Article de revue -
Fullerene-grafted block copolymers used as compatibilizer in P3HT/PCBM bulk heterojunctions: morphology and photovoltaic performances
(European Physical Journal: Applied Physics. vol. 56, n° 3, pp. art nb 34107, 2011)Article de revue -
Chemically Amplified Photoresists for 193-Nm Photolithography: Effect of Molecular Structure and Photonic Parameters on Photopatterning
(Journal of Polymer Science Part A: Polymer Chemistry. vol. 48, n° 6, pp. 1271-1277, 2010)Article de revue