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Fullerene-grafted block copolymers used as compatibilizer in P3HT/PCBM bulk heterojunctions: morphology and photovoltaic performances
(European Physical Journal: Applied Physics. vol. 56, n° 3, pp. art nb 34107, 2011)Article de revue -
Chemically Amplified Photoresists for 193-Nm Photolithography: Effect of Molecular Structure and Photonic Parameters on Photopatterning
(Journal of Polymer Science Part A: Polymer Chemistry. vol. 48, n° 6, pp. 1271-1277, 2010)Article de revue -
Hierarchical self-assembly of nanoparticles for optical metamaterials
(Materials Horizons. vol. 3, n° 6, pp. 596-601, 2016)Article de revue -
Chemically Amplified Photoresists for 193-nm Photolithography: Effect of Molecular Structure and Photonic Parameters on Photopatterning
(Journal of polymer science: Part A, General papers. vol. 48, n° 6, pp. 1271-1277, 2010)Article de revue -
Energetic fluctuations in amorphous semiconducting polymers: Impact on charge-carrier mobility
(Journal of Chemical Physics. vol. 147, n° 13, pp. 134904, 2017)Article de revue -
Synthesis of a Conductive Copolymer and Phase Diagram of Its Suspension with Single-Walled Carbon Nanotubes by Microfluidic Technology
(Macromolecules. vol. 48, pp. pp. 7473-7480, 2015)Article de revue