Recherche
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Chemically Amplified Photoresists for 193-Nm Photolithography: Effect of Molecular Structure and Photonic Parameters on Photopatterning
(Journal of Polymer Science Part A: Polymer Chemistry. vol. 48, n° 6, pp. 1271-1277, 2010)Article de revue -
Chemically Amplified Photoresists for 193-nm Photolithography: Effect of Molecular Structure and Photonic Parameters on Photopatterning
(Journal of polymer science: Part A, General papers. vol. 48, n° 6, pp. 1271-1277, 2010)Article de revue -
Impact of molecular structure of polymer in 193 nm resist performance
(Microelectronic Engineering. vol. 86, n° 4-6, pp. 796-799, 2009)Article de revue -
Synthesis of a Conductive Copolymer and Phase Diagram of Its Suspension with Single-Walled Carbon Nanotubes by Microfluidic Technology
(Macromolecules. vol. 48, pp. pp. 7473-7480, 2015)Article de revue