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Development of a 0D model to investigate the plasma chemistry in a Townsend discharge in the mixture N2/O2 : role of the associative ionization mechanisms in the memory effect

DAP, Simon
Matériaux et Procédés Plasmas [LAPLACE-MPP]
LIN, Xi
Certified Adaptive discRete moDels for robust simulAtions of CoMplex flOws with Moving fronts [CARDAMOM]
LAboratoire PLasma et Conversion d'Energie [LAPLACE]
TYL, Clémence
Sciences et Ingénierie des Plasmas Réactifs et des Arcs [LAPLACE-ScIPRA]
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en
Communication dans un congrès
Este ítem está publicado en
16th International Symposium on High Pressure Low Temperature Plasma Chemistry (HaKone XVI), Sept. 2-7, 2018, Beijing (CHINA), 2018, Beijing. 2018
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https://oskar-bordeaux.fr/handle/20.500.12278/190659
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