Triethylamine borane thermal decomposition for BN low pressure chemical vapour deposition
Langue
EN
Article de revue
Ce document a été publié dans
Surface and Coatings Technology. 2023-11-15, vol. 472, p. 129927
Résumé en anglais
Triethylamine borane (TEAB) complex was studied as a potential precursor for the thermal low pressure chemical vapour deposition (LPCVD) of pure crystalline sp2-hybridised BN. In particular, its thermal decomposition with ...Lire la suite >
Triethylamine borane (TEAB) complex was studied as a potential precursor for the thermal low pressure chemical vapour deposition (LPCVD) of pure crystalline sp2-hybridised BN. In particular, its thermal decomposition with or without ammonia was characterised from thermodynamic and experimental points of view in the temperature ranges 400–2000 °C and 300–1300 °C, respectively. NH3 plays a role in the gas phase equilibrium by providing a nitriding source that promotes HCN formation at high temperatures. NH3 is also a source of hydrogen for light hydrocarbons formation as it decomposes. It is thus possible to promote gaseous carbon species formation at high temperatures and limit carbon introduction into coatings by adding ammonia. A turbostratic BN coating could be obtained by CVD from a TEAB/NH3/N2 mixture and conditions chosen thanks to the gas phase decomposition study.< Réduire
Mots clés en anglais
Triethylamine borane
LPCVD
BN
FTIR
Thermodynamics
Unités de recherche