MONTESDEOCA, Santiago; SEAH, Hock Soon; BÉNARD, Pierre; VERGNE, Romain; THOLLOT, Joëlle; RALL, Hans-Martin; BENVENUTI, Davide

doi:10.1145/3092919.3092928

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MONTESDEOCA, Santiago
Nanyang Technological University [Singapour] [NTU]

SEAH, Hock Soon
Nanyang Technological University [Singapour] [NTU]

BÉNARD, Pierre
Melting the frontiers between Light, Shape and Matter [MANAO]

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Communication dans un congrès avec actes

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Expressive 2017, the Symposium on Computational Aesthetics, Sketch-Based Interfaces and Modeling, and Non-Photorealistic Animation and Rendering, 2017-07-28, Los Angeles. 2017-07-29p. 10

Résumé en anglais

We investigate characteristic edge-and substrate-based effects for watercolor stylization. These two fundamental elements of painted art play a significant role in traditional watercolors and highly influence the pigment's behavior and application. Yet a detailed consideration of these specific elements for the stylization of 3D scenes has not been attempted before. Through this investigation, we contribute to the field by presenting ways to emulate two novel effects: dry-brush and gaps & overlaps. By doing so, we also found ways to improve upon well-studied watercolor effects such as edge-darkening and substrate granulation. Finally, we integrated controllable external lighting influences over the watercolorized result, together with other previously researched watercolor effects. These effects are combined through a direct stylization pipeline to produce sophisticated watercolor imagery, which retains spatial coherence in object-space and is locally controllable in real-time.< Réduire

Mots clés en anglais

watercolor

dry-brush

direct stylization

gaps & overlaps

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Edge- and substrate-based effects for watercolor stylization

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