Tailoring plasmonic field enhancement in spatial and spectral domains
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en
Communication dans un congrès avec actes
Ce document a été publié dans
2012 International Conference on Optical MEMS and Nanophotonics (OMN), 2012 International Conference on Optical MEMS and Nanophotonics (OMN 2012), 2012-08-06, Banff. 2012
Résumé en anglais
Three-dimensional patterning of gold nano-particles on SiO2 and Si substrates is performed by ion-beam lithography with 15-20 nm resolution. Realization of an on-demand achiral and chiral modifications of nano-structures ...Lire la suite >
Three-dimensional patterning of gold nano-particles on SiO2 and Si substrates is performed by ion-beam lithography with 15-20 nm resolution. Realization of an on-demand achiral and chiral modifications of nano-structures are demonstrated. Simulations of optical properties of the obtained nano-architectures reveal the possibility to tailor the field enhancement both in the spatial and spectral domains, which are foreseen to be applicable for light harvesting and opto-mechanics at nanoscale.< Réduire
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