Tailoring plasmonic field enhancement in spatial and spectral domains
Language
en
Communication dans un congrès avec actes
This item was published in
2012 International Conference on Optical MEMS and Nanophotonics (OMN), 2012 International Conference on Optical MEMS and Nanophotonics (OMN 2012), 2012-08-06, Banff. 2012
English Abstract
Three-dimensional patterning of gold nano-particles on SiO2 and Si substrates is performed by ion-beam lithography with 15-20 nm resolution. Realization of an on-demand achiral and chiral modifications of nano-structures ...Read more >
Three-dimensional patterning of gold nano-particles on SiO2 and Si substrates is performed by ion-beam lithography with 15-20 nm resolution. Realization of an on-demand achiral and chiral modifications of nano-structures are demonstrated. Simulations of optical properties of the obtained nano-architectures reveal the possibility to tailor the field enhancement both in the spatial and spectral domains, which are foreseen to be applicable for light harvesting and opto-mechanics at nanoscale.Read less <
Origin
Hal imported