Influence of Substrate Temperature and Film Thickness on Thermal, Electrical, and Structural Properties of HPPMS and DC Magnetron Sputtered Ge Thin Films
Langue
en
Article de revue
Ce document a été publié dans
Advanced Engineering Materials. 2017, vol. 19, n° 5, p. 1600854
Wiley-VCH Verlag
Résumé en anglais
Ge was deposited as thickness gradient films at temperatures up to 800C by direct current (DC) and high power pulsed magnetron sputtering (HPPMS). Structural characterization shows increased crystallization with increasing ...Lire la suite >
Mots clés en anglais
Germanium
Thin Films
Thermal Properties
Electrical Properties
DC Magnetron