Influence of Substrate Temperature and Film Thickness on Thermal, Electrical, and Structural Properties of HPPMS and DC Magnetron Sputtered Ge Thin Films
Idioma
en
Article de revue
Este ítem está publicado en
Advanced Engineering Materials. 2017, vol. 19, n° 5, p. 1600854
Wiley-VCH Verlag
Resumen en inglés
Ge was deposited as thickness gradient films at temperatures up to 800C by direct current (DC) and high power pulsed magnetron sputtering (HPPMS). Structural characterization shows increased crystallization with increasing ...Leer más >
Palabras clave en inglés
Germanium
Thin Films
Thermal Properties
Electrical Properties
DC Magnetron