Photoluminescence of GaN microcrystallites prepared by a new solvothermal process
BARRIERE, Albert-Serge
Laboratoire d'études de l'intégration des composants et systèmes électroniques [IXL]
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Laboratoire d'études de l'intégration des composants et systèmes électroniques [IXL]
Langue
en
Article de revue
Ce document a été publié dans
Materials Research Bulletin. 2002, vol. 1, n° 5, p. 841-848
Elsevier
Résumé en anglais
GaNmicrocrystallites have been prepared by asolvothermalprocess. The influence of the synthesis temperature on the crystallinity of the resulting GaN has been studied on three samples, prepared at 400, 600 and 800°C in the ...Lire la suite >
GaNmicrocrystallites have been prepared by asolvothermalprocess. The influence of the synthesis temperature on the crystallinity of the resulting GaN has been studied on three samples, prepared at 400, 600 and 800°C in the same pressure conditions (150 MPa) and duration (6 h). The resulting powders were characterized by several techniques: X-ray diffraction to evaluate the reaction rate, scanning electron microscopy (SEM) to determine the morphology and size of the microcrystallites and photoluminescence to evaluate the quality of the powders.< Réduire
Mots clés en anglais
Nitrides, Crystal growth, High pressure, Optical properties
Origine
Importé de halUnités de recherche