SAADEDDIN, Iyad; SULEIMAN, Mohammed; SALMAN, Haneen; ZRIKEM, Khawla; SONG, Giljoo; ROUGIER, Aline

doi:10.1016/j.ssi.2019.115129

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SAADEDDIN, Iyad
Faculty of science

SULEIMAN, Mohammed
Faculty of science

SALMAN, Haneen
Faculty of science

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Solid State Ionics. 2019, vol. 343, p. 115129 (10 p.)

Elsevier

Résumé en anglais

In this work, the electrochromic and structural properties of NiO thin films prepared using optimized low valueelectrodeposition parameters were studied. The optimized parameters were deposition current density, molarconcentration of nickel nitrate solution, and deposited charge density. The highest electrochromic characteristicscorresponded to deposition parameters of −0.05 mA/cm2 deposition current density, 0.02M of Ni(NO3)2.6H2Osolution, and charge density of 80 mC/cm2. For this optimized film, at 630 nm wavelength, the transmittancemodulation ΔT was 76%, the efficiency η was 19 cm2/C, the charge reversibility Qc/Qa was 97%, and a remarkablecontrast ratio CR of 5.9. In addition, a good cycling stability was confirmed up to 900 cycles.Optimized NiO thin films were poorly crystallized exhibiting a nano-flake structure, high porosity, and homogeneity.< Réduire

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Electrochromism

Nickel oxide

Electrodeposition parameters

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Optimization of low value electrodeposition parameters of nano-structured NiO electrochromic thin films

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