Optimization of low value electrodeposition parameters of nano-structured NiO electrochromic thin films
Language
en
Article de revue
This item was published in
Solid State Ionics. 2019, vol. 343, p. 115129 (10 p.)
Elsevier
English Abstract
In this work, the electrochromic and structural properties of NiO thin films prepared using optimized low valueelectrodeposition parameters were studied. The optimized parameters were deposition current density, ...Read more >
In this work, the electrochromic and structural properties of NiO thin films prepared using optimized low valueelectrodeposition parameters were studied. The optimized parameters were deposition current density, molarconcentration of nickel nitrate solution, and deposited charge density. The highest electrochromic characteristicscorresponded to deposition parameters of −0.05 mA/cm2 deposition current density, 0.02M of Ni(NO3)2.6H2Osolution, and charge density of 80 mC/cm2. For this optimized film, at 630 nm wavelength, the transmittancemodulation ΔT was 76%, the efficiency η was 19 cm2/C, the charge reversibility Qc/Qa was 97%, and a remarkablecontrast ratio CR of 5.9. In addition, a good cycling stability was confirmed up to 900 cycles.Optimized NiO thin films were poorly crystallized exhibiting a nano-flake structure, high porosity, and homogeneity.Read less <
English Keywords
Electrochromism
Nickel oxide
Electrodeposition parameters
Origin
Hal imported