A facile space-confined solid-phase sulfurization strategy for growth of high-quality ultrathin molybdenum disulfide single crystals
SONG, Jingfeng
Department of Physics and Astronomy [Lincoln]
Nebraska Center for Materials and Nanoscience
Department of Physics and Astronomy [Lincoln]
Nebraska Center for Materials and Nanoscience
DUCHARME, Stephen
Department of Physics and Astronomy [Lincoln]
Nebraska Center for Materials and Nanoscience
Department of Physics and Astronomy [Lincoln]
Nebraska Center for Materials and Nanoscience
CUI, Bai
Nebraska Center for Materials and Nanoscience
Department of Mechanical and Materials Engineering
Nebraska Center for Materials and Nanoscience
Department of Mechanical and Materials Engineering
HONG, Xia
Department of Physics and Astronomy [Lincoln]
Nebraska Center for Materials and Nanoscience
< Réduire
Department of Physics and Astronomy [Lincoln]
Nebraska Center for Materials and Nanoscience
Langue
en
Article de revue
Ce document a été publié dans
Nano Letters. 2018-02-12, vol. 18, n° 3, p. 2021-2032
American Chemical Society
Résumé en anglais
Single-crystal transition metal dichalcogenides (TMDs) and TMD-based heterojunctions have recently attracted significant research and industrial interest owing to their intriguing optical and electrical properties. However, ...Lire la suite >
Single-crystal transition metal dichalcogenides (TMDs) and TMD-based heterojunctions have recently attracted significant research and industrial interest owing to their intriguing optical and electrical properties. However, the lack of a simple, low-cost, environmentally friendly, synthetic method and a poor understanding of the growth mechanism post a huge challenge to implementing TMDs in practical applications. In this work, we developed a novel approach for direct formation of high-quality, monolayer and few-layer MoS2 single crystal domains via a single-step rapid thermal processing of a sandwiched reactor with sulfur and molybdenum (Mo) film in a confined reaction space. An all-solid-phase growth mechanism was proposed and experimentally/theoretically evidenced by analyzing the surface potential and morphology mapping. Compared with the conventional chemical vapor deposition approaches, our method involves no complicated gas-phase reactant transfer or reactions and requires very small amount of solid precursors [e.g., Mo (∼3 μg)], no carrier gas, no pretreatment of the precursor, no complex equipment design, thereby facilitating a simple, low-cost, and environmentally friendly growth. Moreover, we examined the symmetry, defects, and stacking phase in as-grown MoS2 samples using simultaneous second-harmonic-/sum-frequency-generation (SHG/SFG) imaging. For the first time, we observed that the SFG (peak intensity/position) polarization can be used as a sensitive probe to identify the orientation of TMDs’ crystallographic axes. Furthermore, we fabricated ferroelectric programmable Schottky junction devices via local domain patterning using the as-grown, single-crystal monolayer MoS2, revealing their great potential in logic and optoelectronic applications. Our strategy thus provides a simple, low-cost, and scalable path toward a wide variety of TMD single crystal growth and novel functional device design.< Réduire
Mots clés en anglais
Sum-frequency generation
Origine
Importé de halUnités de recherche