Evidence of diffusion at BaTiO3/silicon interfaces
Idioma
en
Article de revue
Este ítem está publicado en
Thin Solid Films. 2012, vol. 520, n° 6, p. 1997-2000
Elsevier
Resumen en inglés
Interdiffusion at interfaces between several materials in integrated structures is becoming more and more challenging. We performed a deep study of diffusion in BaTiO3/Si films using X-Ray Diffraction analysis, Rutherford ...Leer más >
Interdiffusion at interfaces between several materials in integrated structures is becoming more and more challenging. We performed a deep study of diffusion in BaTiO3/Si films using X-Ray Diffraction analysis, Rutherford Backscattering Spectrometry and X-ray Photoelectron Spectroscopy at intermediate annealing stages. We show that controlling local chemistry through inter-diffusion phenomena at interfaces is possible thanks to the structural and chemical matching between BaTiO3 and fresnoite. BaTiO3/Si stacks can serve as a model system to investigate the interphase generation at interfaces.< Leer menos
Palabras clave en inglés
Barium titanate
Interface
Rutherford Backscattering Spectrometry (RBS)
Thin films
Diffusion
X-ray photoelectron spectroscopy (XPS)
Interphase growth
Orígen
Importado de HalCentros de investigación