CARMINATI, Paul; BUFFETEAU, Thierry; DAUGEY, Nicolas; CHOLLON, Georges; REBILLAT, Francis; JACQUES, Sylvain

doi:10.1016/j.tsf.2018.08.020

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CARMINATI, Paul
Laboratoire des Composites Thermostructuraux [LCTS]

BUFFETEAU, Thierry

Institut des Sciences Moléculaires [ISM]

DAUGEY, Nicolas
Institut des Sciences Moléculaires [ISM]

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Ce document a été publié dans

Thin Solid Films. 2018, vol. 664, p. 106-114

Résumé en anglais

The structural and morphological characteristics of flat BN coatings processed by chemical vapour deposition, using BCl3−NH3−H2 gas mixtures at low pressure (P < 1 kPa), have been investigated as a function of the deposition temperature (ranging from 900 °C to 1400 °C) and the total gas flow rate. The resulting BN coatings are mainly turbostratic but with heterogeneous microstructures, i.e. mixtures of poorly and highly organized domains. The structural homogeneity and the degree of crystallization depend notably on the nature of the dilution gas (either H2 or Ar) and the depletion of gas species. The decrease of the apparent activation energy from 80 kJ.mol-1 below 1200 °C to 40 kJ.mol-1 above 1200 °C reflects a change in the deposition regime. Ex situ Fourier transform infrared analysis of the residual gas mixture allowed intermediate species leading to poorly or highly organized BN to be tracked and then connected with the main reaction paths leading to the different BN coatings.< Réduire

Mots clés en anglais

Boron nitride

Boron trichloride

Aminodichloroborane

Dichloroborane

Effective precursor

Crystallization degree

Structural homogeneity

Fourier-transform Infrared spectroscopy

URI

https://oskar-bordeaux.fr/handle/20.500.12278/112151

DOI

http://dx.doi.org/10.1016/j.tsf.2018.08.020

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Low pressure chemical vapour deposition of BN: Relationship between gas phase chemistry and coating microstructure

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Low pressure chemical vapour deposition of BN: Relationship between gas phase chemistry and coating microstructure

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Résumé en anglais

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DOI

Unités de recherche