Low pressure chemical vapour deposition of BN: Relationship between gas phase chemistry and coating microstructure
Langue
EN
Article de revue
Ce document a été publié dans
Thin Solid Films. 2018-10-01, vol. 664, p. 106-114
Résumé en anglais
The structural and morphological characteristics of flat BN coatings processed by chemical vapour deposition, using BCl3−NH3−H2 gas mixtures at low pressure (P < 1 kPa), have been investigated as a function of the deposition ...Lire la suite >
The structural and morphological characteristics of flat BN coatings processed by chemical vapour deposition, using BCl3−NH3−H2 gas mixtures at low pressure (P < 1 kPa), have been investigated as a function of the deposition temperature (ranging from 900 °C to 1400 °C) and the total gas flow rate. The resulting BN coatings are mainly turbostratic but with heterogeneous microstructures, i.e. mixtures of poorly and highly organized domains. The structural homogeneity and the degree of crystallization depend notably on the nature of the dilution gas (either H2 or Ar) and the depletion of gas species. The decrease of the apparent activation energy from 80 kJ.mol-1 below 1200 °C to 40 kJ.mol-1 above 1200 °C reflects a change in the deposition regime. Ex situ Fourier transform infrared analysis of the residual gas mixture allowed intermediate species leading to poorly or highly organized BN to be tracked and then connected with the main reaction paths leading to the different BN coatings< Réduire
Mots clés en anglais
Boron nitride
Boron trichloride
Aminodichloroborane
Dichloroborane
Effective precursor
Crystallization degree
Structural homogeneity
Fourier-transform infrared spectroscopy
Unités de recherche